The solution for demanding RF plasma processing

cito Plus offers superior pulsing quality, stability and power measurement accuracy, making it the best choice for plasma deposition and etch applications, as well as for non-semiconductor applications.

• High up time - focus on throughput and lower operating costs
• Value in accuracy, repeatability and stability - meet your process requirements
• Higher power efficiency - better economics and environmental friendly footprint

Benefits

• Improved plasma stability for process repeatability
• Ideal pulse waveforms into high VSWR
• Precise power accuracy for tighter control of plasma processing
• Cable length insensitivity for ease of system integration
• Increased efficiency for lower operating costs

• Better stability over what is on the tools now
• Can be used for Bias and source

• Available interfaces: RS-232C, Ethernet, Profibus, etc.)
• Coaxial cable insensitivity – no need to adjust for length – keep the same cables
• Air-cooled no cooling lines
• Easy user friendly front panel control or passive panel
• AC input large range covered 187 VAC ~ 250 VAC

Upgrade now!